Our group mainly explores wide-bandgap (WBG) and ultra-wide bandgap (UWBG) materials, devices, and circuits for next-generation electronics applications. Our current research focuses on a few major areas: (1) WBG semiconductors for power and RF electronics; (2) Power device reliability and robustness, packaging, circuit-level integration, and system-level applications; (3) Machine learning assisted material-device-circuit co-design; (4) WBG and UWBG materials and devices for electronic, photonic, biological and quantum applications; (5) Devices, circuits and systems for extreme environment applications.

Our group mainly published in the communities of Electron Devices and Power Electronics. Here is a sketch of the group’s major corresponding-authored papers till Aug. 2025.
  1. Electron Devices: IEDM (21), ISPSD (12), IRPS (7), IEEE Electron Device Lett. (21), Appl. Phys. Lett. (14), IEEE Trans. Electron Devices (16)
  2. Power Electronics: IEEE Trans. Power Electronics (21), IEEE J. Emerg. Sel. Top. Power Electron. (3), APEC (16), ECCE (7)
  3. Broad Fields: Nat. Electron. (1), Nat. Commun. (1), Nat. Rev. Electr. Eng. (1), Adv. Mater. (1)

We typically have openings for PhD students, postdoctoral researchers, and visiting scholars with backgrounds in cleanroom fabrication, semiconductor devices, and power electronics circuits. Most PhD students admitted to our group have prior publications in the relevant fields. If you are interested, please contact Professor Yuhao Zhang. Although the peak PhD application season is from September to December, we accept applications year-round. We provide full financial support to all PhD students and also assist with applications to the Hong Kong PhD Fellowship Scheme and the HKU Presidential PhD Scholar Programme.

Related Links:

Selected Publications:

  • Y. Qin, Z. Yang, H. Gong, A. Jacobs, J. Spencer, M. Porter, B. Wang, K. Sasaki, C-H. Lin, M. Tadjer, and Y. Zhang*, “10 kV, 250 oC Operational, Enhancement-Mode Ga2O3 JFET with Charge-Balance and Hybrid-Drain Designs,” 2024 IEEE International Electron Devices Meeting (IEDM), Dec. 2024 (selected as the IEDM Technical Highlight)
  • X. Yang, R. Zhang, Q. Yang, Q. Song, E. Litchford, A. J. Walker, S. Pidaparthi, C. Drowley, D. Dong, Q. Li, and Y. Zhang*, “Evaluation and MHz Converter Application of 1.2-kV Vertical GaN JFET,” IEEE Transactions on Power Electronics, vol. 39, no. 12, pp. 15720–15731, Dec. 2024.
  • M. Xiao, Y. Wang, R. Zhang, Q. Song, M. Porter, E. Carlson, K. Cheng, K. Ngo, and Y. Zhang*, “Robust Avalanche in 1.7 kV Vertical GaN Diodes With a Single-Implant Bevel Edge Termination,” IEEE Electron Device Letters, vol. 44, no. 10, pp. 1616–1619, Oct. 2023. (2023 IEEE George Smith Award)
  • Y. Zhang*, F. Udrea*, and H. Wang*, “Multidimensional device architectures for efficient power electronics,” Nature Electronics, vol. 5, no. 11, Nov. 2022.
  • Xiao, Y. Ma, Z. Du, V. Pathirana, K. Cheng, A. Xie, E. Beam, Y. Cao, F. Udrea, H. Wang, and Y. Zhang*, “Multi-Channel Monolithic-Cascode HEMT (MC2-HEMT): A New GaN Power Switch up to 10 kV,” 2021 IEEE International Electron Devices Meeting (IEDM), Dec. 2021. (selected as the IEDM Technical Highlight, covered by Nature Electronics).

Major Awards of the Group:

  • 2025 Yuhao Zhang, HE Research Fellowship by HE Science Foundation
  • 2025 Yuhao Zhang, Young Scientist Award of the Compound Semiconductor Week for “Significant contributions to wide-bandgap and ultra-wide-bandgap power devices with pioneering demonstrations of multidimensional devices – superjunction, multi-channel, and FinFET – in GaN and Ga2O3.”
  • 2025 Joseph Kozak (alumina), Richard M. Bass Outstanding Young Power Electronics Engineer Award
  • 2025 Qihao Song and Xin Yang, 2025 APEC Best Presentation Awards
  • 2024 IEDM Technical Highlight of the 2024 70th IEEE International Electron Devices Meeting (IEDM)
  • 2024 46th JSAP (Japanese Society of Applied Physics) Award for Best Review Paper (only one awardee each year in all JSAP journals)
  • 2024 IEEE E. George Smith Award for the best paper of the year in IEEE Electron Devices Letters (only one awardee each year)
  • 2024 Yuhao Zhang, Office of Naval Research (ONR) Young Investigator Program (YIP) Award
  • 2023 Ruizhe Zhang, APEC Best Presentation Award
  • 2022 Yuhao Zhang, Faculty Fellow Award of Virginia Tech Engineering
  • 2021 IEDM Technical Highlight of the 2021 67th IEEE International Electron Devices Meeting
  • 2021 Yuhao Zhang, National Science Foundation CAREER Award
  • 2021 Yuhao Zhang, Outstanding Assistant Professor Award of Virginia Tech Engineering
  • 2021 Joseph Kozak, Ph. D. Thesis Talk Award of the IEEE Power Electronics Society (5 awardees each year in the world)
  • 2021 Qihao Song, APEC Best Presentation Award 2021
  • 2020 IEDM Technical Highlight of the 2020 66th IEEE International Electron Devices Meeting (IEDM)
  • 2019 IEEE E. George Smith Award for the best paper of the year in IEEE Electron Devices Letters (only one awardee each year)
  • 2017 Yuaho Zhang, MIT Microsystems Technology Laboratories Best Doctoral Dissertation Award

📑 Journal Papers/Articles

Our newest journal papers

First Characterization of Si IGBT, SiC MOSFET, and GaN HEMT at Deep Cryogenic Temperatures down to 10 Millikelvins

Electrical energy conversion at deep cryogenic temperatures (T < 4.2 K) is highly desirable for applications in space exploration, quantum computing, biomedical imaging, and emerging power delivery systems. However, the operational viability of power semiconductor devices in this temperature regime remains largely unexplored. Notably, no prior studies have reported high-voltage or dynamic switching characteristics of GaN and SiC power devices below 77 K. In this work, we present the first comprehensive characterization of the static and dynamic performance of Si IGBT, SiC MOSFET, and GaN HEMT devices down to 10 mK. A cryogen-free dilution refrigerator, originally designed for quantum physics experiments, is adapted for power device testing by integration with a custom circuit setup for double-pulse testing (DPT) and dynamic on-resistance (RON) test. At T < 1 K, all three devices are found to retain the normally-off operation, high breakdown voltage, and the capability of hardswitching under gate control. GaN HEMTs demonstrate the absence of dynamic RON degradation, with RON decreasing by 4 times compared to room temperature. This can be explained by the trap freeze-out and increased channel mobility. Differently, SiC MOSFET becomes non-Ohmic below ∼60 K. The knee voltages (VK) of SiC MOSFET and Si IGBT both increase at lower temperatures, leading to elevated conduction loss. The sustained current conduction and high VK in lowly-doped SiC and Si drift layers, despite carrier freeze-out, can be explained by the shallowlevel impact ionization with donor states. These findings lay the foundation for developing deep cryogenic power electronics at temperatures below the current operational boundaries.

📰 Conference Papers

Our newest conference papers

Dynamic Reliability of IC-Interface GaN HEMTs Demonstrated Under Ultra-Fast (ns), High-Frequency (MHz) Gate Overvoltage Stress (>30V)

The small gate overvoltage margin is of real concern in p-gate GaN HEMTs in converter applications. Recently, ICeGaN® (Integrated Circuit Enhancement-mode GaN) device deploys a monolithically integrated power IC interface to expand the static operation window to be similar to those of Si MOSFET and Si IGBT. However, the dynamic response of the IC interface under nanosecond gate bias (VG) overshoot, as well as the gate reliability under megahertz switching frequency (fSW), have never been studied. This work addresses this gap by developing a new circuit to generate the application-like V G overshoot profiles with dVG/dt up to 10 V Ins andfsw up to 3 MHz. The IC interface is shown to respond in nanosecond and clamp the VG,IN below 7 V under an external V G overshoot up to 80 V and dVG/dt of 7 V Ins. Uniquely for p-gate GaN devices, ICeGaN shows no degradation under long-term overvoltage stress under 30-V VG overshoot at 3-MHzfsw. This is the first report of the dynamic response of GaN monolithic gate protection ICs under ultra-fast overshoot. Test results reveal that the on-chip IC interface can substantially enhance dynamic gate reliability and robustness of p-gate GaN HEMTs.

Dynamic Stability and Reliability of Multi-Kilovolt GaN Monolithic Bidirectional HEMT
Dynamic Stability and Reliability of Multi-Kilovolt GaN Monolithic Bidirectional HEMT

GaN monolithic bidirectional switch (MBDS) has the potential to enable revolutionary advances in AC power conversion. Despite the availability of industrial 650−V MBDS engineering samples, there have been very few reliability reports of GaN MBDS, and none has been performed up to kilovolt. Here we demonstrate a GaN enhancement-mode (E-mode) MBDS with high breakdown voltage (BV) over 3 kV in both polarities, and for the first time, study the dynamic stability and reliability of a GaN MBDS up to ±1.2kV blocking voltage. The device deploys a dual p-GaN junction termination extension (D JTE) design to achieve high BV. Pulse I-V, HTGB, and HTRB measurements were performed with an emphasis on the unique stress for bidirectional devices, including the reverse bias blocking and the impact of high-side gate. We find the dynamic on-resistance of the JTE-MBDS is sensitive to the low-side gate bias but insensitive to the high-side gate bias. Under the HTRB test, the MBDS shows larger shifts in on-resistance and threshold voltage under the reverse bias blocking compared to those under the forward bias blocking. Physical mechanisms are discussed and supported by TCAD simulations. Overall, our work suggests the importance of establishing a new framework for reliability evaluation of MBDS devices, which must account for the asymmetric trapping dynamics under bidirectional voltage blocking, as well as the impact of the second gate.

First Demonstration of Optically-Controlled 650 V Power GaN HEMT with Ultrafast Switching Speed

Optically-controlled power devices offer a promising solution for reducing electromagnetic interference and enhancing device synchronization for stacked devices in many applications like grid and renewable energy processing. This work, for the first time, demonstrates the optical control of a 650 V GaN HEMT using two low-power photodiodes (PDs) to achieve ultrafast hard switching. We apply complementary optical signals to two InGaAs PDs in a totem-pole configuration, providing rapid charging and discharging paths for power device. The GaN HEMT is found to be particularly suited for such configuration due to its low input capacitance compared to SiC and Si devices. The design is experimentally validated under a 400 V hard switching condition using a double-pulse test (DPT) setup. At 400 V/ 3 A hard switching, the fall and rise times of 63.2 ns and 64 ns were demonstrated under a 45-mW power consumed on each PD. These results represent the highest switching voltage and switching current reported in optically-controlled GaN devices, as well as the fastest switching speeds reported in all optically-controlled power devices to date. This work highlights the potential of the PD-based optical driving scheme and the optically-controlled GaN HEMTs for emerging power electronics applications.

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